Khoom
-
1050NMM / 1058 / 1064nM Bandpass Lim rau Biochemical Analyzer
Qhia peb cov kev hloov tshiab tshiab tshaj plaws hauv Biochemical Kev Ntsuam Xyuas Technology - Bandpass lim rau biochemical analyzers. Cov ntxaij lim dej no tau tsim los txhim kho kev ua tau zoo thiab raug ntawm Biochemistry tsom xam, ua kom pom tseeb thiab ntseeg tau rau ntau cov ntawv thov.
-
Precision optical slit - Chrome ntawm khob
Substrate:B270
Qhov seem ntev:-0.1 hli
Thickness kam rau:± 0.05mm
Dos tiaj:3(1)@632.8nm
Zoo Tshaj:40/20
Kab dav:0.1mm & 0.05 hli
Sawv:Av, 0.3mm max. Qhov dav dav bevel
Ntshiab Aperture:90%
Parallelism:<5 "
Cov txheej:High optical density opaque chrome, tabs <0.01% uvisible nthwv dej -
Precision hom phiaj phiaj-concave thiab ob chav me me conaves
Substrate:Cdgm / schott
Qhov seem ntev:-0.05 hli
Thickness kam rau:± 0.05mm
Lub vojvoog thev naus laus zis:± 0.02mm
Dos tiaj:1(0.5)@632.8nm
Zoo Tshaj:40/20
Sawv:Kev tiv thaiv bevel raws li xav tau
Ntshiab Aperture:90%
Centering:<3 '
Cov txheej:Rabs <0.5%@deign nthwv wavelength -
Theem Micrometers Kev sib tshooj sib thooj nplai
Substrate:B270
Qhov seem ntev:-0.1 hli
Thickness kam rau:± 0.05mm
Dos tiaj:3(1)@632.8nm
Zoo Tshaj:40/20
Kab dav:0.1mm & 0.05 hli
Sawv:Av, 0.3mm max. Qhov dav dav bevel
Ntshiab Aperture:90%
Parallelism:<5 "
Cov txheej:High optical density opaque chrome, tabs <0.01% uvisible nthwv dej
Pob tshab Thaj Chaw, Ar: R <0.35% uvisible wavelength -
Laser Qib Plano-Convex Lock
Substrate:UV Fused Silica
Qhov seem ntev:-0.1 hli
Thickness kam rau:± 0.05mm
Dos tiaj:1(0.5)@632.8nm
Zoo Tshaj:40/20
Sawv:Av, 0.3mm max. Qhov dav dav bevel
Ntshiab Aperture:90%
Centering:<1 '
Cov txheej:Rabs <0.25 iOS no@design yoj
Kev puas tsuaj pib:532nm: 10J / cm², 10ns mem tes
1064nm: 10J / cm², 10ns mem tes -
Precision Reticles - Chrome ntawm Khob
Substrate:B270 / N-BK7 / H-K9L
Qhov seem ntev:-0.1 hli
Thickness kam rau:± 0.05mm
Dos tiaj:3(1)@632.8nm
Zoo Tshaj:20/10
Kab dav:Tsawg kawg 0.003mm
Sawv:Av, 0.3mm max. Qhov dav dav bevel
Ntshiab Aperture:90%
Parallelism:<30 "
Cov txheej:Ib Txheej Mgf2, Ravg <1.5%5@design yojKab / dot / Daim duab: CR lossis CR2O3
-
Txhuas Txheej Daim Iav Rau Teeb
Substrate: B270®
Qhov seem ntev:± 0.1mm
Thickness kam rau:± 0.1mm
Dos tiaj:3(1)@632.8nm
Zoo Tshaj:60/40 lossis zoo dua
Sawv:Av thiab blacken, 0.3mm max. Qhov dav dav bevel
Tom qab nto:Av thiab blacken
Ntshiab Aperture:90%
Parallelism:<5 "
Cov txheej:Tiv Thaiv Txhuas Txheej, R> 90% @ 430-67N0NM, AOI = 45 ° -
Hniav cov hniav ultra siab reflector rau daim iav hniav
Substrate:B270
Qhov seem ntev:-0.05 hli
Thickness kam rau:± 0.1mm
Dos tiaj:1(0.5)@632.8nm
Zoo Tshaj:40/20 lossis zoo dua
Sawv:Av, 0.1-0.2mm. Qhov dav dav bevel
Ntshiab Aperture:95%
Cov txheej:Dielectric txheej, r> 99.9 tiam no ugisible wavelength, Aoi = 38 ° -
Plano-concave Daim iav rau Laser Counter
Substrate:Boroflollal®
Qhov seem ntev:± 0.1mm
Thickness kam rau:± 0.1mm
Dos tiaj:1(0.5)@632.8nm
Zoo Tshaj:60/40 lossis zoo dua
Sawv:Av, 0.3mm max. Qhov dav dav bevel
Tom qab nto:Teb
Ntshiab Aperture:85%
Cov txheej:Nws yog xim hlau (tiv thaiv kub) txheej -
Broadband ar coated achromatic lo ntsiab muag
Substrate:Cdgm / schott
Qhov seem ntev:-0.05 hli
Thickness kam rau:± 0.02mm
Lub vojvoog thev naus laus zis:± 0.02mm
Dos tiaj:1(0.5)@632.8nm
Zoo Tshaj:40/20
Sawv:Kev tiv thaiv bevel raws li xav tau
Ntshiab Aperture:90%
Centering:<1 '
Cov txheej:Rabs <0.5%@deign nthwv wavelength -
Lub voj voos thiab duab dhos lub tog raj kheej
Substrate:Cdgm / schott
Qhov seem ntev:± 0.05mm
Thickness kam rau:± 0.02mm
Lub vojvoog thev naus laus zis:± 0.02mm
Dos tiaj:1(0.5)@632.8nm
Zoo Tshaj:40/20
Centering:<5 '(puag ncig duab)
<1 '(duab plaub)
Sawv:Kev tiv thaiv bevel raws li xav tau
Ntshiab Aperture:90%
Cov txheej:Raws li xav tau, Tsim Wavelength: 320 ~ 2000nm -
UV Fused Silica Dichroic Longpe Lim
Substrate:B270
Qhov seem ntev: -0.1 hli
Thickness kam rau: ±0.05mm
Dos tiaj:1(0.5) @ 632.8NM
Zoo Tshaj: 40/20
Sawv:Av, 0.3mm max. Qhov dav dav bevel
Ntshiab Aperture: 90%
Parallelism:<5"
Cov txheej:Ravg> 95% los ntawm 740 txog 795 nm @ 45 ° Aoi
Cov txheej:Ravg <5% los ntawm 810 txog 900 nm @ 45 ° Aoi